CCS-1000 Critical Cleaning System



Damage-Free Wafer Cleaning Beyond 65 nm


  • Eliminate oxide etching


  • Achieve unmatched cleaning performance


  • Improve surface roughening--NO surface damage


  • Create a paradigm shift


  • Reduce operation costs--drastically


  • Revolutionize cleaning processes


  • Establish a green--and safe--environment--without any waste


  • Eliminate expensive chemicals used in SC-1 and SC-2