NGT’s Patent Portfolio

• Broadly covers inventive systems, processes, and compositions for effectively cleaning integrated circuit substrates
• Solves many problems presented by conventional cleaning methods

Pending Patents Cover:

• Various embodiments that produce an activated cleaning solution containing solute clusters and covering a wide range of concentrations of the activated solution
• Various methods for cleaning IC substrates, such as wafers, using an activated solution, in single or batch mode
• Cleaning IC substrates for various applications, including semiconductor wafers, masks, disks, flat panels, liquid crystal displays, thin film heads, photo masks, and lenses
• Systems and methods that address the collapsing pattern problem
• Rinsing an IC substrate with the inventive DI water solution after cleaning
• Evaluating a cleaning solution by using UV absorbance